This technology, developed and patented by Kloé under the name “Dilase”, is based on the use of photosensitive organic-inorganic hybrid materials and on laser direct writing in these materials.

1. Organic-inorganic hybrid materials combine properties of organic materials (compliance, photosensitivity, low cost process) and properties of inorganic materials (thermal resistance, mechanical behaviour and stability in time).
Using precursors containing aluminium, silicon, zirconium or titanium, it’s possible to cover a large range of refractive indexes (from n=1,4 to n=1,8).
These hybrid materials represent a new alternative for the manufacturing of integrated optical circuits but their applications also extend to manufacturing of adhesives, lithography of thick resins, functional layers...

2. The process of photolithography by direct writing allows writing optical circuits with a structured and focused laser beam in a photosensitive material. The Dilase process, an all automated writing technique developed by Kloé, obtains a writing resolution about a few hundreds of nanometers with very good reproductibility.

Thanks to the flexibility of the Dilase technology, it’s possible to make fast prototyping and to propose customized components in small and average series. This advanced technology concerns all sectors whose applications need a treatment of the optical signal and specific procedures of microfabrication at room temperature.