Kloé has also developed its own K-CL lithography negative resins range based on hybrid organic-inorganic materials.

The presence of a mineral network in the structure gives these resins specific mechanical properties, such as a strong resistance to semiconductors wet etching solutions, to RIE, DRIE and plasma dry etching solutions. These resins are also compatible with high form factors (>10) because of their mechanical structure.

The hybrid composition of K-CL resins allows to adjust the threshold sensitivity and thus to obtain very high resolutions and lithography angles of 90°.

Thanks to their composition, K-CL resins can be used at wavelengths beyond 405 nm.