The Dilase technology developed and patented by Kloé also depends on its know-how in the development of organic-inorganic hybrid materials. These vitreous materials synthesized by sol-gel process, are the source of a new generation of materials that meet the needs of a wide range of applications. The adjustment of the organic/inorganic ratio allows Kloé to propose a wide range of solutions: optical layers, optical adhesives, coatings, and resins, offering high performance thermal, mechanic and optical properties.

Thus as part of the know-how and heart of the business, the development of hybrid materials allows Kloé to offer thirty new materials, some of which are patented. These materials are applicable to innovative optical adhesives, anti-scratch coatings, hydrophobic, lipophilic, anti-reflection, or to thin or thick lithography resins, writable at 325, 375 or 405 nm wavelength.

The wide range of applications of hybrid materials and the presence of the leading specialists of the sol-gel process within the company, led us to offer our customers a service of material development to specification.

Today, our materials are qualified by many customers including many major multinational industrial groups.

The K-Px adhesive range developed and patented by Kloé is synthesized with organomineral precursors. The final compound is a hybrid structure made up of two parts, one organic, the other inorganic.

These solutions exhibit quite a few interesting physical and chemical properties such as low ETC/TEC, a low shrinkage, a high mechanical resistance to chemical agents like acid or base, and a good aging stability.

Mechanical properties and stability over time result from the presence of a mineral network when compliance and photosensibility are induced by the organic network. K-Px adhesives cure either thermally, by insolation or by a combination of both processes for several optical assemblies. Your layer thicknesses will range from 50nm to 100µm in standard.

So, your Kloé solutions present mechanical and thermal properties that are much more stable than the polymer compositions.

These adhesives have been already qualified for numerous applications in domains like aerospace, interconnects, optical assemblies and in cryogenic environments.

 K-Px range - Product Datasheet (1.72 MB)

 K-PT - Technical Datasheet (724.96 kB)

 K-PU - Technical Datasheet (732.52 kB)

 K-PUM - Technical Datasheet (750.72 kB)

Kloé has also developed its own range of K-CL lithography negative resins based on hybrid organic-inorganic materials.

The presence of a mineral network in the structure gives these resins after polymerization, specific mechanical properties, such as a strong resistance to semiconductors wet etching solutions, to RIE, DRIE and plasma dry etching solutions. These resins are also compatible with high form factors (>10) because of their excellent mechanical characteristics.

The hybrid nature of K-CL range resins can offer different levels of sensitivity and thus obtain patterns of very high resolution and lithography angles of 90°.

Due to the large range available, K-CL resins offer an operating range at wavelengths between 325 and 405 nm.

Also, some compositions are divided according to different formulations capable of producing very thick deposits (between 500nm and 300µm) in a one-pass process.

These easy to use materials may be made using the most common techniques : spin coating, dip-coating, spray-coating, doctorblade ...

 K-CL - Product Datasheet (2.77 MB)

 K-CL - Technical Datasheet (734.03 kB)