Kloé finalized several contracts with new prestigious customers during July.
Presently, Kloé signed new contacts with L’Oréal, Valéo, Thales Optronics, Onéra and Cilas.
The company has also been approached by Airbus, Total, Genopole, Thales Angenieux and Thales Alenia Space, with whom negotiations are still in progress.
This interest is motivated by the large competence of Kloé team in high resolution direct laser writing, in development of new optical materials and in optical fiber and integrated sensors.
Kloé invites you to attend the exposition and demonstration of its equipments during the Optatec 2010 in Frankfurt, Germany, on June 15, 16, 17 and 18, 2010.
Kloé invites you to attend the exposition and demonstration of their high resolution «Dilase» range laser writers, during the Photonics West 2010 in San Francisco, on January 26, 27, and 28, 2010.
These demonstrations will take place at booth 1823-E, South Hall, Moscone center.
In addition, Kloé presents two other UV LED exposure and masking systems: the UV-KUB and the K-ILU.
Kloé invites you to attend the exposition and demonstration of its Dilase range (click here to view the Dilase 750 demo video), composed of high resolution laser writers, at Laser World of Photonics 2009 in Munich, on June 15th, 16th, 17th and 18th, 2009. Demonstrations will take place at booth 479-1, Hall B1.
Kloé will also present its UV-KUB, an UV LED insolator/masker.
New techniques of measurement and control of very low temperatures by optical fibers.
Kloé has developed a new system of temperature measurement by optical fibers to monitor the operation of machinery, piping and storage tanks operating at cryogenic temperatures.
The system called "K-BGS monitoring unit," has been validated in real conditions during tests at cryogenic temperature (liquid nitrogen) of a line test from a single flexible pipe designed to transfer offshore liquefied natural gas (LNG) on the production site Trait of Technip, a world leader in the manufacture and installation of flexible pipes for offshore oil and gas.
Micro-leakages of liquid nitrogen to the pipe were also simulated and were instantly detected by the sensors in the “K-BGS monitoring unit system” with a high optical dynamic in a few seconds.
Even a small leakage can thus be detected, localized and quantified quickly allowing for safety measures to be taken as soon as possible.
The optical components and systems dedicated to the detection of explosive gas leakages developed and patented by Kloé under the name K-BGS are in validation phase with one of the european leaders in oil and gas industry. After two years of development and positive tests, the industrial environment validation phase begins.
The optical bonding solutions developed and patented by Kloé follow qualification tests at CNES (National Center of Space Studies). This phase of qualification constitutes the last step after mechanical, optical and gaz desorption tests conducted these last years by Sagem Reosc.
Kloé develops a new range of industrial laser writers dedicated to manufacturing. This challenge is relevant to the « Mosahyc » project, for which Kloé is supported by the Languedoc-Roussillon Region and French Finances and Industry Ministery. The first Dilase 850 will then be produced in 2010.
Kloé announces a profit of 300k€ after closing fiscal year 2007. This excellent result is the fruit of 7 years of development and innovations with the registration of more than 10 patents added to 2 others registered in partnership with customers.
This is also the result of an aggressive innovation policy implemented since the company's founding. Today, to complete its range of integrated optical components, Kloé provides prototyping equipments such as Direct laser writers (« Dilase ») and UV maskers (« UV-KUB »).
Kloé, already know as a leading company in photowriting process, through its Direct Laser writing technology « Dilase », commercializes UV-KUB, a new range of equipments dedicated to photosensitive layers UV curing. UV-KUB is an insolator/masker based on UV-LED emitting at 365nm, 375nm, 385nm.
This compact equipment (26x26x26 cm3) can be used to cure wafers from 1 to 4 inches. It can also work as a masker in hard or soft contact configurations, thanks to a mask to wafer distance control exhibiting a resolution of 10µm. The equipment presents a large range of other advantages: ((click here)).
Kloé invites you to attend the exposition and demonstration of its high resolution laser lithography equipment of the « Dilase » range, during the Opto and Vision Show at Paris Expo, Porte de Versailles, on September 25, 26 and 27, 2007.
The demonstrations will take place at Opton Laser International, Hall 7 ;2, stand F 26.
In addition, Kloé presents UV-KUB, an UV LED insolator /masker at the Innovation Schowcase , Hall 7.2, stand C12. UV-KUB was selected to compete in Photon 2007, the yearly award given to the best innovations in optics and photonics by French laboratories and companies.
The Commissariat à l’Energie Atomique (CEA) of Grenoble, which is interested in surface micro-nanostructuration technology and fast prototyping, launched an open tendering in order to get a large surface and very high resolution laser lithography equipment.
Dilase 750 by Kloé was the selected product. Dilase 750 is an equipment which is entirely flexible and equipped with two writing lasers and three optical axes for beam shaping for writing. This equipment weighs about 1200 kg and measures about 170x170x130 cm3: it’s currently the only equipment that allows submicronic patterns to be written on surfaces as broad as 1600 cm2.
Kloé, which launched its range of Dilase equipment in 2006 and received the Silver Photon in September 2006 for this innovation, hopes that this first reference will help it to become a major player in the field of lithography equipment by photoinscription.
Two international projects in which Kloé is a technological partner have been approved by the pole of Competitiveness in Photonics, which is controlled by POP Sud.
The first project is MOSAHYC in collaboration with Essilor International, CEA Liten, GES, and ISEN. The second one is MINIATOM in collaboration with the Institute of Optics, Thales, ONERA and IXSEA.
Essilor International and Kloé have been working together since 2002 and just began a new 18 month research and development contract. This is the fourth contract signed between both companies.
At the same time, the project ECOFRAME, which concerns the development of new networks of broadband access, began on February 1st, 2007. This project is financed by the ANR and gathers around the same problems Alcatel-Lucent, France Telecom, the ENST, the ENST Brittany, the National Institute of Telecommunications, the University of Versailles, X-LIM and Kloé.
Kloé has to propose new solutions to integrate the optical and optoelectronical functions on the same chip.
The companies Kloé and Opton Laser International signed an agreement to market the Dilase products in France. The Dilase equipment are benches of high resolution laser direct writing for applications of fast prototyping in integrated optics, microstructuration, microfluidics, microoptics or microelectronics.
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