The Commissariat à l’Energie Atomique (CEA) of Grenoble, which is interested in surface micro-nanostructuration technology and fast prototyping, launched an open tendering in order to get a large surface and very high resolution laser lithography equipment.

Dilase 750 by Kloé was the selected product. Dilase 750 is an equipment which is entirely flexible and equipped with two writing lasers and three optical axes for beam shaping for writing. This equipment weighs about 1200 kg and measures about 170x170x130 cm3: it’s currently the only equipment that allows submicronic patterns to be written on surfaces as broad as 1600 cm2.

Kloé, which launched its range of Dilase equipment in 2006 and received the Silver Photon in September 2006 for this innovation, hopes that this first reference will help it to become a major player in the field of lithography equipment by photoinscription.